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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 101-110 of 171 (Search time: 0.004 seconds).
Item hits:
Issue Date
Title
Author(s)
2007-02
Characteristics and prevention of pattern collapse in EUV lithography
오혜근
2016-09
Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning
오혜근
2016-09
Mechanical stress induced by external forces in the extreme ultraviolet pellicle
오혜근
2009-06
Investigation of Resolution Enhancement by Using Interferometric Immersion Lithography with a Lloyd Mirror
오혜근
2008-01
32 nm 1:1 Line and Space Patterning by Resist Reflow Process
오혜근
2015-10
Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction
오혜근
2016-05
The impact of the residual stress on the EUV pellicle
오혜근
2016-05
Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography
오혜근
2007-04
The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask
오혜근
2007-04
Resist Reflow Modeling Including Surface Tension and Bulk Effect
오혜근
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-Subject
20
Lithography
9
EUV lithography
9
lithography
8
ellipsometry
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EUVL
7
EUV mask
7
Simulation
6
Chemically amplified resist
6
Lithography simulation
6
Resist reflow process
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2020 - 2021
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2010 - 2019
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2000 - 2009
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