Results 1-7 of 7 (Search time: 0.002 seconds).
|2007-09||Critical dimension control for 32 nm random contact hole array with resist reflow process||오혜근|
|2008-01||32 nm 1:1 Line and Space Patterning by Resist Reflow Process||오혜근|
|2008-03||32 nm 1:1 line and space patterning by resist reflow process||정희준|
|2008-11||22 nm 1:1 line and space patterning by using double patterning and resist reflow process||오혜근|
|2007-02||Photoresist adhesion effect of resist reflow process||오혜근|
|2008-02||32 nm 1:1 line and space patterning by resist reflow process||오혜근|
|2008-02||Resist reflow process for arbitrary 32 nm node pattern||오혜근|