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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 61-70 of 171 (Search time: 0.008 seconds).
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Issue Date
Title
Author(s)
2008-11
Haze defects due to pellicle adhesive
오혜근
2008-11
Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process
오혜근
2008-11
22 nm 1:1 line and space patterning by using double patterning and resist reflow process
오혜근
2017-03
Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography
오혜근
2017-03
CD Error Caused by Aberration and Its Possible Compensation by Optical Proximity Correction in Extreme-Ultraviolet Lithography
오혜근
2017-03
Arc-shaped slit effect of EUV lithography with anamorphic high NA system in terms of critical dimension variation
오혜근
2016-06
Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle
오혜근
2008-08
Ellipsometry for Pellicle-Covered Surface
오혜근
2008-12
Influence of mask feature on the diffracted light in proximity and contact lithography
오혜근
2008-02
Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness
오혜근
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-Subject
20
Lithography
9
EUV lithography
9
lithography
8
ellipsometry
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EUVL
7
EUV mask
7
Simulation
6
Chemically amplified resist
6
Lithography simulation
6
Resist reflow process
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2020 - 2021
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2010 - 2019
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2000 - 2009
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1999 - 1999
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