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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 51-60 of 171 (Search time: 0.001 seconds).
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Issue Date
Title
Author(s)
2017-06
Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography
오혜근
2017-09
Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node
오혜근
2008-09
Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach
오혜근
2008-11
A mask generation approach to double patterning technology with inverse lithography
오혜근
2008-05
Application of ellipsometry in immersion lithography
오혜근
2008-11
Influence of Various Defects on Extreme Ultra-Violet Mask
오혜근
2008-11
Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application
오혜근
2008-11
Solving the Navier-Stokes Equation for Thermal Reflow
오혜근
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-Subject
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Lithography
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EUV lithography
9
lithography
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ellipsometry
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EUVL
7
EUV mask
7
Simulation
6
Chemically amplified resist
6
Lithography simulation
6
Resist reflow process
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2020 - 2021
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2010 - 2019
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