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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 61-70 of 141 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2008-12
Influence of mask feature on the diffracted light in proximity and contact lithography
오혜근
2008-02
Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness
오혜근
2008-02
The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(
오혜근
2008-02
Optimum biasing for 45 nm node chromeless and attenuated phase shift mask
오혜근
2008-02
32 nm 1:1 line and space patterning by resist reflow process
오혜근
2008-02
22 nm node contact hole formation in extreme ultra-violet lithography
오혜근
2008-02
Resist reflow process for arbitrary 32 nm node pattern
오혜근
2008-02
Critical dimension control for 32 nm node random contact hole array using resist reflow process
오혜근
2008-06
Anisotropic resist reflow process simulation for 22 nm elongated contact holes
오혜근
2006-06
Mask haze measurement by spectroscopic ellipsometry
오혜근
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-Subject
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Lithography
9
lithography
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ellipsometry
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Simulation
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Chemically amplified resist
6
Lithography simulation
6
Resist reflow process
5
Aerial image
5
EUV lithography
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EUV mask
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