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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 11-18 of 18 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2006-11
Investigation of optimum biasing and undercut for single trench alternating phase shift mask in 193 nm lithography
오혜근
2006-11
Chromeless phase lithography using scattering bars and zebra patterns
오혜근
2006-07
Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks
오혜근
2006-07
Evaluation of partial coherent imaging using the modulation transfer function in immersion lithography
오혜근
2006-08
Modeling for Resist Reflow of an Elongated Contact Hole
오혜근
2006-08
The influence of transmission reduction by mask haze formation in ArF lithography
오혜근
2006-12
Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography
오혜근
2006-06
Mask haze measurement by spectroscopic ellipsometry
오혜근
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193 nm excimer laser
1
32 nm node
1
Absorber characteristics
1
Aerial image intensity
1
alternating phase shift mask
1
anti-reflection coating (ARC)
1
benchmark simulation
1
bias
1
chromeless phase lithography (CPL)
1
Chromeless Phase Shift Mask
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