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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Issue Date
Title
Author(s)
2015-04
Patterning dependence on the mask defect for extreme ultraviolet lithography
오혜근
2010-03
Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography
정영대
2011-01
Advanced Lithography Simulation for Various 3-Dimensional Nano/Microstructuring Fabrications in Positive- and Negative-Tone Photoresists
정영대
2010-12
Simulation Study of Sub-10 nm Pattern Formation Using Diblock Polymer Directed Self-assembly
정영대
2010-05
A study of virtual lithography process for polymer directed self-assembly
정영대
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Lithography simulation
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Self-assembly
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Self-assembly process
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Block copolymer
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CD errors
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CD variation
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Chemically Amplified Resist
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