2008-11 | Haze defects due to pellicle adhesive | 오혜근 |
2009-11 | Heat conduction from hot plate to photoresist on top of wafer including heat loss to the environment | 오혜근 |
2008-11 | Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach | 오혜근 |
2008-11 | Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application | 오혜근 |
2008-08 | High-current-density CuOx/InZnOx thin-film diode for cross-point memory applications | 강보수 |
2020-04 | Highly stable, solution-processed quaternary oxide thin film-based resistive switching random access memory devices via global and local stoichiometric manipulation strategy | 강보수 |
2002-09 | Hydrogen-induced degradation in ferroelectric Bi3.25La0.75Ti3O12 | 강보수 |
2002-11 | Hydrogen-induced degradation mechanisms in ferroelectric (Bi,La)4Ti3O12 and Pb(Zr,Ti)O3 thin films | 강보수 |
2000-12 | Hydrogenation of ZnO:Al Thin Films Using Hot Filament | 김옥경 |
1999-08 | Image Charge Effects on Bremsstrahlung Radiation from Electron-Dust Grain Scattering in Dusty Plasmas | 정영대 |
2001-07 | Image charge effects on electron capture by dust grains in dusty plasmas | 정영대 |
2017-03 | Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography | 오혜근 |
2009-04 | Impact of Polarization Inside a Resist for ArF Immersion Lithography | 정영대 |
2009-08 | Impact of the Parameters for a Chemically-amplified Resist on the Line-edge-roughness by Using a Molecular-scale Lithography Simulation | 정영대 |
2016-05 | The impact of the residual stress on the EUV pellicle | 오혜근 |
2017-01 | Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations | 오혜근 |
2006-02 | Improvement of column spacer uniformity in a TFT LCD panel | 오혜근 |
2018-10 | In-depth data on the network structure and hourly activity of the Central Chilean power grid | 손승우 |
2000-07 | Inelastic Compton scattering of photons by bound atomic electrons in weakly coupled plasmas | 정영대 |
2017-06 | Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography | 오혜근 |