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Showing results 1 to 20 of 229

Issue DateTitleAuthor(s)
2008-1122 nm 1:1 line and space patterning by using double patterning and resist reflow process오혜근
2008-0222 nm node contact hole formation in extreme ultra-violet lithography오혜근
2008-0132 nm 1:1 Line and Space Patterning by Resist Reflow Process오혜근
2008-0332 nm 1:1 line and space patterning by resist reflow process정희준
2008-0232 nm 1:1 line and space patterning by resist reflow process오혜근
2007-0232 nm pattern collapse modeling with radial distance and rinse speed오혜근
2007-0832nm Pattern Collapse Modeling with Radial Distance and Rinse Speed오혜근
2007-01Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature오혜근
2008-11Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask오혜근
2007-09Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask오혜근
2006-12Adaptive Noise Estimation Using Least-Squares Line in Wavelet Packet Transform Domain권영헌
2008-06Adaptive Wavelet Packet Transformation에서 다양한 Filter를 이용한 Speech Enhancement의 비교에 관한 연구권영헌
2008-06Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)오혜근
2004-05Aerial image characterization for the defects in the extreme ultraviolet mask오혜근
2019-12Almost minimum error discrimination of N-ary weak coherent states by Jaynes-Cummings Hamiltonian dynamics권영헌
2018-04Analysis of Optimal Sequential State Discrimination for Linearly Independent Pure Quantum States권영헌
2015-06Analysis of optimal unambiguous discrimination of three pure quantum states권영헌
2017-01Analytical model of variable characteristic of coefficient of restitution and its application to ball trajectory planning권영헌
2004-09Anisotropic dielectric properties in epitaxial Bi3.25La0.75Ti3O12 thin films along different crystal directions강보수
2008-06Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes홍주유