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COLLEGE OF ENGINEERING SCIENCES[E](공학대학)
MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과)
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2018-03
Novel plasma enhanced chemical vapor deposition of highly conformal SiN films and their barrier properties
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ATOMIC LAYER DEPOSITION
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GATE DIELECTRICS
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H FILMS
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N-2 PLASMA
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NITRIDE THIN-FILMS
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OPTICAL-PROPERTIES
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SILICON-NITRIDE
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TECHNOLOGY
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2018
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