Hanyang University repository
menu
검색
Library
Hanyang
Browse
Communities & Collections
Titles
Authors
My Repository
My Account
Receive email updates
Edit Profile
Repository at Hanyang University
Search
All of Repository
COLLEGE OF ENGINEERING SCIENCES[E](공학대학)
MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과)
Articles
Theses (Master)
Theses (Ph.D.)
Start a new search
Current filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Add filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Results/Page
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort items by
Relevance
Title
Issue Date
In order
Ascending
Descending
Authors/record
All
1
5
10
15
20
25
30
35
40
45
50
Results 1-8 of 8 (Search time: 0.001 seconds).
Item hits:
Issue Date
Title
Author(s)
2019-10
Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process
박진구
2019-02
Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning
박진구
2019-01
Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications
박진구
2019-05
Selection of CVD Diamond Crystal Size on a CVD Pad Conditioner for Improved Lifetime
박진구
2019-08
Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning
박진구
2019-06
A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process
박진구
2019-09
Ultrasound-induced break-in method for an incoming polyvinyl acetal (PVA) brush used during post-CMP cleaning process
박진구
2019-05
Preface-JSS Focus Issue on CMP for Sub-10 nm Technologies
박진구
previous
1
next
Discover
-Subject
3
PVA brush
2
Break-in process
2
Microelectronics - Semiconductor ...
2
Post CMP cleaning
1
Abrasive particles agglomeration
1
ADS surfactant
1
Cleaning
1
CMP pad conditioner
1
Conditioner lifetime
1
Conditioning process
next >
BROWSE
Communities & Collections
Titles
Authors