| 2012-12 | Material removal mechanism of single and polycrystalline silicon in alkaline slurry | 박진구 |
| 2015-08 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 박진구 |
| 2021-02 | Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process | 박진구 |
| 2021-03 | Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning | 박진구 |
| 2006-09 | Metal CMP 용 컨디셔너 디스크 표면에 존재하는 다이아몬드의 형상이 미치는 패드 회복력 변화 | 박진구 |
| 2017-12 | Metal Surface Chemical Composition and Morphology | 박진구 |
| 2016-12 | Modification of DHF for removal of metals from silicon wafer | 박진구 |
| 2013-04 | Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP | 박진구 |
| 2015-05 | Multi-stack extreme-ultraviolet pellicle with out-of-band reduction | 박진구 |
| 2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 박진구 |
| 2010-12 | Nano gas cluster dry cleaning for damage free particle removal | 박진구 |
| 2020-03 | Nanocatalyst-induced hydroxyl radical (·OH) slurry for tungsten CMP for next-generation semiconductor processing | 박진구 |
| 2020-03 | Nanocatalyst-induced hydroxyl radical ((OH)-O-center dot) slurry for tungsten CMP for next-generation semiconductor processing | 박진구 |
| 2007-06 | Nanoparticle scanning and detection on flat and structured surfaces using fluorescence microscopy | 박진구 |
| 2012-07 | Nanoscale Particle Removal Using Wet Laser Shockwave Cleaning | 박진구 |
| 2005-10 | Nanoscale Particles Removal on an Extreme Ultra-Violet Lithography(EUVL) Mask Layer by Lasershock Cleaning | 박진구 |
| 2001-07 | Nanotribological Characterization of Fluorocarbon Thin Film by Plasma Enhanced CVD | 박진구 |
| 2002-03 | Next Generation Scratch and Corrosion Free Conditioner for Chemical Mechanical Planarization | 박진구 |
| 2009-11 | A novel approach for scratch detection and study on dependency of scratches during oxide CMP | 박진구 |
| 2017-10 | Novel method for nano-surface analysis of Cu CMP chemicals by AFM and microfluidic chip system | 박진구 |
| 2015-03 | Novel one-step route to induce long-term lotus leaf-like hydrophobicity in polyester fabric | 박진구 |
| 2010-05 | Numerical and Experimental Evaluation of Picoliter Inkjet Head for Micropatterning of Printed Electronics | 박진구 |
| 2013-04 | On the mechanism of material removal by fixed abrasive lapping of various glass substrates | 박진구 |
| 2013-04 | Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers | 박진구 |
| 2010-12 | Optimization of CO 2 gas cluster generation for cleaning application | 박진구 |
| 2010-12 | Optimization of DIO 3with megasonic cleaning of Ru capped EUVL mask for effective carbon contaminant removal | 박진구 |
| 2005-11 | Optimizing the Plasma Deposition Process Parameters of Antistiction Layers using a DOE(Design of Experiment) | 박진구 |
| 2005-07 | Particle Adhesion and Removal on EUV Mask Layers During Wet Cleaning | 박진구 |
| 2017-12 | Particle Deposition and Adhesion | 박진구 |
| 2001-11 | Particle Removal and Its Mechanism on Hydrophobic Silicon Wafer in Highly Diluted NH4OH Solutions with an Added Surfactant | 박진구 |
