| 2018-06 | Comparative Study of the Growth Characteristics and Electrical Properties of Atomic-Layer-Deposited HfO2 Films obtained from Metal Halide and Amide Precursors | 김우희 |
| 2023-03-16 | Dysprosium Incorporation for Phase Stabilization of Atomic-Layer- Deposited HfO2 Thin Films | 김우희 |
| 2018-10 | The Effects of Ar Addition to O2 Plasma on the Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films | 김우희 |
| 2018-06 | Effects of Nb nanopin electrode on resistive random-access memory switching characteristics of NiO thin films | 김우희 |
| 2017-12 | Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone | 김우희 |
| 2021-02 | Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules | 김우희 |
| 2016-02 | Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor | 김우희 |
| 2019-08 | Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor | 김우희 |
| 2020-05 | Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes | 김우희 |
| 2015-05 | In Situ Surface Cleaning on a Ge Substrate using TMA and MgCp2 for HfO2-based Gate Oxides | 김우희 |
| 2017-02 | Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide | 김우희 |
| 2021-06 | Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity | 김우희 |
| 2022-07 | Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates | 김우희 |
| 2016-04 | Local Ferroelectric Responses of Epitaxial PbTiO3 Thin Films to Heated Atomic Force Microscopy | 김우희 |
| 2021-10 | Metal-insulator transition and interfacial thermal transport in atomic layer deposited Ru nanofilms characterized by ultrafast terahertz spectroscopy | 김우희 |
| 2019-09 | Out-of-Plane Piezoresponse of Monolayer MoS2 on Plastic Substrates Enabled by Highly Uniform and Layer-Controllable CVD | 김우희 |
| 2019-06 | Phase-Controlled Synthesis of SnOx Thin Films by Atomic Layer Deposition and Post-Treatment | 김우희 |
| 2019-03 | Piezoelectric and ferroelectric characteristics of P(VDF-TrFE) thin films on Pt and ITO substrates | 김우희 |
| 2016-04 | A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation | 김우희 |
| 2017-11 | Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns | 김우희 |
| 2022-10 | Rhenium oxide/sulfide binary phase flakes decorated on nanofiber support for enhanced activation of electrochemical conversion reactions | 김우희 |
| 2021-12 | A strategy for wafer-scale crystalline MoS2 thin films with controlled morphology using pulsed metal-organic chemical vapor deposition at low temperature | 김우희 |
| 2019-03 | Structural and Ferroelectric Properties of P(VDF-TrFE) Thin Films Depending on The Annealing Temperature | 김우희 |
| 2020-01 | Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition | 김우희 |
| 2019-11 | Synthesis of two-dimensional MoS2/graphene heterostructure by atomic layer deposition using MoF6 precursor | 김우희 |
| 2017-11 | Thermal Adsorption-Enhanced Atomic Layer Etching of Si3N4 | 김우희 |
| 2019-07 | Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor | 김우희 |
| 2019-08 | Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 degrees C Using an Aminodisilane Precursor | 김우희 |
| 2017-01 | Uniform Color Coating of Multilayered TiO2/Al2O3 Films by Atomic Layer Deposition | 김우희 |
| 2021-05 | Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method | 김우희 |
