| 2021-03 | 2D materials-based membranes for hydrogen purification: Current status and future prospects | 안지훈 |
| 2023-02 | Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD | 안지훈 |
| 2023-01 | Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method | 안지훈 |
| 2022-06 | Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method | 안지훈 |
| 2021-03 | Atomic layer deposited strontium niobate thin films as new high-k dielectrics | 안지훈 |
| 2018-10 | Characteristics of Copper Microspheres Grown by Using Mixed-Source Hydride Vapor-Phase Epitaxy | 안지훈 |
| 2019-10 | Comparative study of the electrical characteristics of ALD-ZnO thin films using H2O and H2O2 as the oxidants | 안지훈 |
| 2019-03 | Comparative study of the electrical characteristics of ALD‐ZnO thin films using H2O and H2O2 as the oxidants | 안지훈 |
| 2017-06 | Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition | 안지훈 |
| 2018-05 | The Correlation Between the Preferred Orientation and Al Distribution of Al-Doped HfO2 Films by Plasma-Enhanced Atomic Layer Deposition | 안지훈 |
| 2017-01 | Depletion effect of polycrystalline-silicon gate electrode by phosphorus deactivation | 안지훈 |
| 2021-05 | Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films | 안지훈 |
| 2020-12 | Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperatures | 안지훈 |
| 2023-06 | Enhanced dielectric and energy storage performances of Hf0.6Zr0.4O2 thin films by Al doping | 안지훈 |
| 2020-11 | Enhanced electrical properties of ZrO2-TiN based capacitors by introducing ultrathin metal oxides | 안지훈 |
| 2023-11 | Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability | 안지훈 |
| 2022-08 | Equivalent oxide thickness scalability of Zr-rich ZrHfO2 thin films by Al-doping | 안지훈 |
| 2021-12 | Evaluating the performance and characteristics of Rutile TiO2 thin film for Triboelectric Nanogenerator (TENG) | 안지훈 |
| 2018-08 | Fabrication of Microholes in Silicon Wafers by Using Wet-Chemical Etching | 안지훈 |
| 2017-02 | Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates | 안지훈 |
| 2020-10 | Growth characteristics of tin sulphides crystals by the vapour transport method using SnS and sulphur powders: effect of temperature and pressure | 안지훈 |
| 2019-07 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition | 안지훈 |
| 2022-07 | Highly Stable Artificial Synapses Based on Ferroelectric Tunnel Junctions for Neuromorphic Computing Applications | 안지훈 |
| 2019-11 | Highly transparent and conductive oxide-metal-oxide electrodes optimized at the percolation thickness of AgOx for transparent silicon thin-film solar cells | 안지훈 |
| 2017-10 | A Hybrid Gate Dielectrics of Ion Gel with Ultra-Thin Passivation Layer for High-Performance Transistors Based on Two-Dimensional Semiconductor Channels | 안지훈 |
| 2023-11 | Implementation of rutile-TiO2 thin films on TiN without post-annealing through introduction of SnO2 and its improved electrical properties | 안지훈 |
| 2018-10 | Low Power Switching Characteristics of CNT Field Effect Transistor Device with Al-Doped ZrHfO2 Gate Dielectric | 안지훈 |
| 2021-03 | Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering | 안지훈 |
| 2019-10 | Modulation of crystal structure and electrical properties of Hf0.6Zr0.4O2 thin films by Al-doping | 안지훈 |
| 2022-11-28 | Phase control of two-dimensional tin sulfide compounds deposited via atomic layer deposition | 안지훈 |
