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Showing results 17 to 25 of 25

Issue DateTitleAuthor(s)
2021-02Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process김태곤
2021-03Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning김태곤
2019-12Nanocatalyst-induced hydroxyl radical (·OH) slurry for tungsten CMP for next-generation semiconductor processing김태곤
2023-11Photoelectrochemical Properties of Pulse-Reverse Electrodeposited Sb2Se3/TiO2 Nanotube Photoanodes' Controlled Sb2Se3 Overlayer김태곤
2019-01Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications김태곤
2017-12Scalable, sub 2μm pitch, Cu/SiCN to Cu/SiCN hybrid wafer-to-wafer bonding technology김태곤
2019-08Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning김태곤
2022-02Study on PVA Brush Loading and Conditioning during Shallow Trench Isolation Post-CMP Cleaning Process김태곤
2019-09Ultrasound-induced break-in method for an incoming polyvinyl acetal (PVA) brush used during post-CMP cleaning process김태곤
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