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COLLEGE OF ENGINEERING[S](공과대학)
ELECTRONIC ENGINEERING(융합전자공학부)
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2013-10
Environmentally clean slurry using nano-TiO2-abrasive mixed with oxidizer H2O2 for ruthenium-film chemical mechanical planarization
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BEHAVIOR
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Chemical mechanical polishing
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DIFFUSION BARRIER
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H2O2
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HYDROGEN-PEROXIDE
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REMOVAL
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Ruthenium
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SHALLOW TRENCH ISOLATION
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TiO2
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2013
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