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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 1-6 of 6 (Search time: 0.002 seconds).
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2020-08
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
안진호
2020-03
Ozone based high-temperature atomic layer deposition of SiO2 thin films
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2020-03
Memory Operations of Zero Impact Ionization, Zero Subthreshold Swing FET Matrix Without Selectors
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2020-03
Enhanced resistive switching characteristics of HfOx insulator fabricated by atomic layer deposition and La(NO3)(3)center dot 6H(2)O solution as catalytic oxidant
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2020-07
A comprehensive study on the effect of tin top and bottom electrodes on atomic layer deposited ferroelectric Hf˂inf˃0.5˂/inf˃Zr˂inf˃0.5˂/inf˃O˂inf˃2˂/inf˃ thin films
안진호
2020-07
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source
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1T-DRAM
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5O(2)
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aluminum nitride
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atomic layer deposition
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atomic layer deposition (ALD)
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DIOXIDE
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FABRICATION
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ferroelectric film
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FILMS
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