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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Issue Date
Title
Author(s)
2015-03
Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( (i) Pr-DAD)(2)
전형탁
2015-11
Electrical characteristics of ALD La2O3 capping layers using different lanthanum precursors in MOS devices with ALD HfO2, HfSiOx, and HfSiON gate dielectrics
최창환
2015-11
Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant
박진성
2015-12
Antireflective conducting nanostructures with an atomic layer deposited an AlZnO layer on a transparent substrate
박진성
2015-11
Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant
박진성
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Transparent conducting oxide
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Indium oxide
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Al doped ZnO
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Anti-reflection coating
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EOT
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La2O3
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Ni(Pr-i-DAD)(2)
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Nickel silicide
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