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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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2012-02
Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone
안진호
2021-12
Microstructures of Hfox films prepared via atomic layer deposition using Ua(NO3)3·6H2O oxidants
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2021-03
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
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2020-07
A comprehensive study on the effect of tin top and bottom electrodes on atomic layer deposited ferroelectric Hf˂inf˃0.5˂/inf˃Zr˂inf˃0.5˂/inf˃O˂inf˃2˂/inf˃ thin films
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3CDS
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graphene dielectrics
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hafnium oxide film
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hollow cathode plasma
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