| 2016-07 | Impact of EUV Pellicle Transmittance on Imaging Performance Analyzed by Coherent Scattering Microscopy | 안진호 |
| 2012-01 | Impact of ozone concentration on atomic layer deposited HfO2 on GaAs | 안진호 |
| 2015-03 | Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography | 안진호 |
| 2022-01 | Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle | 안진호 |
| 2011-03 | Improved electrical properties of Pt/HfO2/Ge using in situ water vapor treatment and atomic layer deposition | 안진호 |
| 2016-07 | Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask | 안진호 |
| 2018-03 | Improved resistive switching characteristics of a Pt/HfO2/Pt resistor by controlling anode interface with forming and switching polarity | 안진호 |
| 2016-04 | Influence of Annealing Temperature on Structural and Optical Properties of Undoped and Al-Doped Nano-ZnO Films Prepared by Sol–Gel Method | 안진호 |
| 2019-04 | Interface-Driven Phase Transition of Phase-Change Material | 안진호 |
| 2022-04 | Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography | 안진호 |
| 2015-07 | Lattice Distortion in In3SbTe2 Phase Change Material with Substitutional Bi | 안진호 |
| 2015-08 | Lattice Distortion in In3SbTe2 Phase Change Material with Substitutional Bi (vol 5, 12867, 2015) | 안진호 |
| 2020-07 | Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source | 안진호 |
| 2018-01 | Mask Materials and Designs for Extreme Ultra Violet Lithography | 안진호 |
| 2019-09 | Material design for Ge2Sb2Te5 phase-change material with thermal stability and lattice distortion | 안진호 |
| 2015-04 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 안진호 |
| 2020-03 | Memory Operations of Zero Impact Ionization, Zero Subthreshold Swing FET Matrix Without Selectors | 안진호 |
| 2014-12 | Metal-HfO2-Ge capacitor: Its enhanced charge trapping properties with S-treated substrate and atomic-layer-deposited HfO2 layer | 안진호 |
| 2021-12 | Microstructures of Hfox films prepared via atomic layer deposition using Ua(NO3)3·6H2O oxidants | 안진호 |
| 2021-11 | Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors | 안진호 |
| 2013-07 | Nanolithography on Graphene by Using Scanning Tunneling Microscopy in a Methanol Environment | 안진호 |
| 2014-11 | Nanopatterned yttrium aluminum garnet phosphor incorporated film for high-brightness GaN-based white light emitting diodes | 안진호 |
| 2014-03 | Nanopatterned yttrium aluminumgarnet phosphor incorporated filmfor high-brightness GaN-based white light emitting diodes high-brightness GaN-based white light emitting diodes | 안진호 |
| 2011-06 | Nanosize Patterning with Nanoimprint Lithography Using Poly(vinyl alcohol) Transfer Layer | 안진호 |
| 2021-07 | A new route of synthesizing atomically thin 2D materials embedded in bulk oxides | 안진호 |
| 2017-01 | Nickel and nickel oxide thin films as absorber layer materials of extreme ultraviolet masks | 안진호 |
| 2020-03 | Ozone based high-temperature atomic layer deposition of SiO2 thin films | 안진호 |
| 2019-10 | Performance of Extreme Ultraviolet Coherent Scattering Microscope | 안진호 |
| 2016-09 | Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography | 안진호 |
| 2019-12 | Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning | 안진호 |
