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Deposition of Charged Particles on a Flat Plate in Parallel Flow in the Presence of an Electric Field

Title
Deposition of Charged Particles on a Flat Plate in Parallel Flow in the Presence of an Electric Field
Author
육세진
Keywords
Brownian diffusion; deposition velocity; electrophoresis; gravitational settling; particulate contamination
Issue Date
2014-05
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, NJ 08855-4141 USA
Citation
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 권: 27, 호: 2, 페이지: 287-293
Abstract
Deposition velocity of charged particles onto a horizontal flat plate in parallel airflow in the presence of an electric field was numerically investigated by employing a Lagrangian particle tracking approach. The plate length was set as 450 mm, i.e., the characteristic length of the next generation wafer. Either the face-up or the face-down critical surface was considered. The electric field strength and the particle density were varied. The particle deposition velocity was greatly influenced by the electric field strength for particles smaller than approximately 0.1 mu m. The influence of the particle density was significant for particles larger than about 0.1 mu m. In case of the face-down critical surface, the deposition velocity was greatly reduced for micrometer-sized particles, whereas it was estimated to be relatively high for sub-micrometer sized particles due to attractive electrophoresis and Brownian diffusion.
URI
http://ieeexplore.ieee.org/document/6714484/http://hdl.handle.net/20.500.11754/49676
ISSN
0894-6507; 1558-2345
DOI
10.1109/TSM.2014.2300493
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MECHANICAL ENGINEERING(기계공학부) > Articles
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