Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김은규 | - |
dc.date.accessioned | 2018-03-17T04:22:27Z | - |
dc.date.available | 2018-03-17T04:22:27Z | - |
dc.date.issued | 2014-04 | - |
dc.identifier.citation | Current Applied Physics, 2014, 14, P.49-52 | en_US |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.issn | 1878-1675 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S1567173913004239?via%3Dihub | - |
dc.description.abstract | We studied oxygen incorporation into ZnTe thin films with nitrogen and oxygen plasma during a plasma-assisted pulsed laser deposition (PA-PLD). It was shown that ZnTe:O layer formed with oxygen plasma exhibits an enhancement of optical transparency in visible spectral region due to the formation of amorphous TeOx. Especially, the ZnTe:NO deposited by PA-PLD under nitrogen and oxygen partial pressures with N-2:O-2 of 10:3 sccm showed p-type semiconducting characteristics and the formation of intermediate band at about 0.5-0.8 eV below the ZnTe band edge. These results for oxygen incorporation in ZnTe thin film such as the enhancement of optical transparency in visible spectral region and the intermediate band formation will be useful for optoelectronic devices or intermediate band solar cells. (C) 2013 Elsevier B.V. All rights reserved. | en_US |
dc.description.sponsorship | This work was supported in part by the National Research Foundation of Korea (NRF) grant funded by the Ministry of Education (NRF-2011-0012006) and by the New and Renewable Energy Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korean Government (MOTIE) (No. 2013010010120). | en_US |
dc.language.iso | en | en_US |
dc.publisher | Elsevier Science B.V | en_US |
dc.subject | Intermediate energy band | en_US |
dc.subject | ZnTe | en_US |
dc.subject | Oxygen incorporation | en_US |
dc.subject | Pulsed laser deposition | en_US |
dc.title | Oxygen incorporation in ZnTe thin films grown by plasma-assisted pulsed laser deposition | en_US |
dc.type | Article | en_US |
dc.relation.volume | 14 | - |
dc.identifier.doi | 10.1016/j.cap.2013.11.043 | - |
dc.relation.page | 49-52 | - |
dc.relation.journal | CURRENT APPLIED PHYSICS | - |
dc.contributor.googleauthor | Pak, S. W. | - |
dc.contributor.googleauthor | Lee, D. U. | - |
dc.contributor.googleauthor | Kim, E. K. | - |
dc.relation.code | 2014028061 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF NATURAL SCIENCES[S] | - |
dc.sector.department | DEPARTMENT OF PHYSICS | - |
dc.identifier.pid | ek-kim | - |
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