Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
- Title
- Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
- Author
- 전형탁
- Keywords
- GAS-DIFFUSION BARRIERS; LIGHT-EMITTING-DIODES; POLYMERS; FILMS
- Issue Date
- 2014-02
- Publisher
- AMER INST PHYSICS, 1305 WALT WHITMAN RD, STE 300, MELVILLE, NY 11747-4501 USA
- Citation
- JOURNAL OF APPLIED PHYSICS; FEB 21 2014, 115, 7, 7p
- Abstract
- Al2O3 films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al2O3 layers with different densities are deposited with different deposition conditions of O-2 plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 x 10(-5) gm(-2) day(-1), which is one order of magnitude less than WVTR for the reference single-density Al2O3 layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O-2 and H2O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic
- URI
- https://aip.scitation.org/doi/abs/10.1063/1.4866001http://hdl.handle.net/20.500.11754/48051
- ISSN
- 0021-8979
- DOI
- 10.1063/1.4866001
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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