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The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2

Title
The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
Author
전형탁
Keywords
remote plasma atomic layer deposition; ruthenium films
Issue Date
2012-12
Publisher
WILEY-V C H VERLAG GMBH, PO BOX 10 11 61, D-69451 WEINHEIM, GERMANY
Citation
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 209, 2, 302-305
Abstract
By using remote plasma atomic layer deposition (ALD), ruthenium thin films were deposited on SiO2 using bis(ethylcy-clopentadienyl) ruthenium [Ru(EtCp)(2)] as a Ru precursor and an ammonia plasma as a reactant. Different plasma treatments were applied, and the best results were obtained with the Ar plasma-treated SiO2 surface. The initial transition region usually observed with Ru deposition before continuous film formation was present, and the number of ALD cycles required to obtain a continuous film was reduced to about 35 cycles on the Ar plasma-treated SiO2 substrates. The transition region of Ru cluster growth on Ar plasma-treated SiO2 was investigated with transmission electron microscopy (TEM). Most of the Ru clusters were larger and better crystallized on the Ar plasma-treated SiO2 than on untreated SiO2. Also, Ru films deposited on the treated SiO2 exhibited a (002) preferred orientated structure with a film resistivity of about 10.26 mu Omega V-cm. The growth rates of Ru after passing the transition region were similar on both the treated and untreated SiO2 at about 1.7 angstrom/cycles. From the Auger electron spectroscopy (AES) spectrum, a very low content of oxygen was observed in the Ru films. About 9% carbon was detected by a rutherford backscattering spectrometer (RBS). (c) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
URI
http://onlinelibrary.wiley.com/doi/10.1002/pssa.201127280/fullhttp://hdl.handle.net/20.500.11754/42899
ISSN
1862-6300
DOI
10.1002/pssa.201127280
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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