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dc.contributor.author박진성-
dc.date.accessioned2018-02-14T02:36:10Z-
dc.date.available2018-02-14T02:36:10Z-
dc.date.issued2011-08-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS; AUG 2011, 50 (8), 6pen_US
dc.identifier.issn0021-4922-
dc.identifier.urihttp://eds.b.ebscohost.com/eds/detail/detail?vid=0&sid=fa9539ee-1bfb-4cb4-8fad-6f45929bfbc0%40pdc-v-sessmgr01&bdata=Jmxhbmc9a28mc2l0ZT1lZHMtbGl2ZQ%3d%3d#AN=000294336600054&db=edswsc-
dc.identifier.urihttp://iopscience.iop.org/article/10.1143/JJAP.50.085502/meta-
dc.description.abstractPhotocatalytic TiO2 thin films were prepared with titanium tetraisopropoxide (TTIP) using cyclic plasma chemical vapor deposition (CPCVD) at atmospheric pressure. The CPCVD TiO2 films contain carbon-free impurities up to 100 degrees C and polycrystalline anatase phases up to 200 degrees C, due to the radicals and ion-bombardments. The CPCVD TiO2 films have high transparency in the visible wavelength region and absorb wavelengths below 400nm (>3.2 eV). The photocatalytic effects of the CPCVD TiO2 and commercial sprayed TiO2 films were measured by decomposing methylene blue (MB) solution under UV irradiation. The smooth CPCVD TiO2 films showed a relatively lower photocatalytic efficiency, but superior catalyst-recycling efficiency, due to their high adhesion strength on the substrates. This CPCVD technique may provide the means to produce photocatalytic thin films with low cost and high efficiency, which would be a reasonable candidate for practical photocatalytic applications, because of the reliability and stability of their photocatalytic efficiency in a practical environment. (C) 2011 The Japan Society of Applied Physicsen_US
dc.description.sponsorshipThis work was supported by the collaborative R&D program with technology advanced country (Development of materials and stacked device structure for next generation solar cells, 2010-advanced-B-105) by the Ministry of Knowledge and Economy, and the Korea Institute of Materials Science (KIMS), a subsidiary branch of the Korea Institute of Machinery and Materials (KIMM).en_US
dc.language.isoenen_US
dc.publisherIOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLANDen_US
dc.subjectATOMIC LAYER DEPOSITIONen_US
dc.subjectTITANIUM-DIOXIDEen_US
dc.subjectSTAINLESS-STEELen_US
dc.subjectSURFACESen_US
dc.subjectGROWTHen_US
dc.subjectDEGRADATIONen_US
dc.subjectPECVDen_US
dc.subjectWATERen_US
dc.subjectGLASSen_US
dc.titlePhotocatalytic Functional Coating of TiO2 Thin Film Deposited by Cyclic Plasma Chemical Vapor Deposition at Atmospheric Pressureen_US
dc.typeArticleen_US
dc.relation.no8-
dc.relation.volume50-
dc.identifier.doi10.1143/JJAP.50.085502-
dc.relation.page1-1-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.contributor.googleauthorKwon, Jung-Dae-
dc.contributor.googleauthorRha, Jong-Joo-
dc.contributor.googleauthorNam, Kee-Seok-
dc.contributor.googleauthorPark, Jin-Seong-
dc.relation.code2011217131-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF MATERIALS SCIENCE AND ENGINEERING-
dc.identifier.pidjsparklime-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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