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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
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2008-02
Optimum Dose Variation Caused By Post Exposure Bake Temperature Difference Inside Photoresist Over Different Sublayers And Thickness
안일신
2003-02
A Practical Method of Extracting the Photoresist Exposure Parameters by Using a Dose-to-Clear Swing Curve
안일신
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CD control
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Dill exposure ABC parameter
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Dose-to-clear swing curve
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Heat condition
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Optimum dose
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PEB (post exposure bake)
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Photolithography simulation
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2008
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2003
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