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dc.contributor.author박원일-
dc.date.accessioned2017-11-07T07:34:14Z-
dc.date.available2017-11-07T07:34:14Z-
dc.date.issued2016-01-
dc.identifier.citationACS APPLIED MATERIALS & INTERFACES, v. 8, NO 1, Page. 834-839en_US
dc.identifier.issn1944-8244-
dc.identifier.urihttp://pubs.acs.org/doi/10.1021/acsami.5b10183-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/30548-
dc.description.abstractWe have studied the role of defects in electrolyte-gated graphene mesh (GM) field-effect transistors (FETs) by introducing engineered edge defects in graphene (Gr) channels. Compared with Gr-FETs, GM-FETs were characterized as having large increments of Dirac point shift (similar to 30-100 mV/pH) that even sometimes exceeded the Nernst limit (59 mV/pH) by means of electrostatic gating of H+ ions. This feature was attributed to the defect-mediated chemisorptions of H+ ions to the graphene edge, as supported by Raman measurements and observed cycling characteristics of the GM FETs. Although the H+ ion binding to the defects increased the device response to pH change, this binding was found to be irreversible. However, the irreversible component showed relatively fast decay, almost disappearing after 5 cycles of exposure to solutions of decreasing pH value from 8.25 to 6.55. Similar behavior could be found in the Gr-FET, but the irreversible component of the response was much smaller. Finally, after complete passivation of the defects, both Gr-FETs and GM-FETs exhibited only reversible response to pH change, with similar magnitude in the range of 68 mV/pH.en_US
dc.description.sponsorshipThis work was supported by the Basic Science Research Program (2015R1A2A2A11001426) and the International Research & Development Program (2013K1A3A1A32035393) of the National Research Foundation of Korea (NRF), funded by the Ministry of Science, ICT and Future Planning (MSIP) of Korea. S.N. acknowledges support from the Air Force Office of Scientific Research/Asian Office of Aerospace Research Development (AFOSR/AOARD) through the Nano Bio Info Technology (NBIT) Phase III Program (AOARD-13-4125).en_US
dc.language.isoenen_US
dc.publisherAMER CHEMICAL SOCen_US
dc.subjectgrapheneen_US
dc.subjectgraphene meshen_US
dc.subjectelectrolyte-gated field effect transistoren_US
dc.subjectpH sensoren_US
dc.subjectnanosensoren_US
dc.subjectdefect-mediated chemisorptionen_US
dc.subjectdefect passivationen_US
dc.titleReversible and Irreversible Responses of Defect-Engineered Graphene-Based Electrolyte-Gated pH Sensorsen_US
dc.typeArticleen_US
dc.relation.no1-
dc.relation.volume8-
dc.identifier.doi10.1021/acsami.5b10183-
dc.relation.page834-839-
dc.relation.journalACS APPLIED MATERIALS & INTERFACES-
dc.contributor.googleauthorKwon, Sun Sang-
dc.contributor.googleauthorYi, Jaeseok-
dc.contributor.googleauthorLee, Won Woo-
dc.contributor.googleauthorShin, Jae Hyeok-
dc.contributor.googleauthorKim, Su Han-
dc.contributor.googleauthorCho, Seunghee H.-
dc.contributor.googleauthorNam, SungWoo-
dc.contributor.googleauthorPark, Won Il-
dc.relation.code2016001740-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF MATERIALS SCIENCE AND ENGINEERING-
dc.identifier.pidwipark-
dc.identifier.researcherIDA-8362-2013-
dc.identifier.orcidhttp://orcid.org/0000-0001-8312-4815-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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