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dc.contributor.author장재영-
dc.date.accessioned2017-11-07T07:12:54Z-
dc.date.available2017-11-07T07:12:54Z-
dc.date.issued2016-01-
dc.identifier.citationPHYSICAL CHEMISTRY CHEMICAL PHYSICS, v. 18, NO 2, Page. 1042-1049en_US
dc.identifier.issn1463-9076-
dc.identifier.issn1463-9084-
dc.identifier.urihttp://pubs.rsc.org/en/Content/ArticleLanding/2016/CP/C5CP06713H#!divAbstract-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/30543-
dc.description.abstractEncapsulation is essential for protecting the air-sensitive components of organic light-emitting diodes (OLEDs), such as the active layers and cathode electrodes. Thin film encapsulation approaches based on an oxide layer are suitable for flexible electronics, including OLEDs, because they provide mechanical flexibility, the layers are thin, and they are easy to prepare. This study examined the effects of the oxide ratio on the water permeation barrier properties of Al2O3/TiO2 nanolaminate films prepared by plasma-enhanced atomic layer deposition. We found that the Al2O3/TiO2 nanolaminate film exhibited optimal properties for a 1 : 1 atomic ratio of Al2O3/TiO2 with the lowest water vapor transmission rate of 9.16 x 10(-5) g m(-2) day(-1) at 60 degrees C and 90% RH. OLED devices that incorporated Al2O3/TiO2 nanolaminate films prepared with a 1 : 1 atomic ratio showed the longest shelf-life, in excess of 2000 hours under 60 degrees C and 90% RH conditions, without forming dark spots or displaying edge shrinkage.en_US
dc.description.sponsorshipThis study was supported by a grant from the National Research Foundation of Korea (NRF), funded by the Korean Government (MSIP NRF-2014R1A2A1A05004993), and by the New & Renewable Energy of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korean Government through the Ministry of Knowledge Economy (no. 20123010010140). This research was also supported by the Samsung Display Corporation.en_US
dc.language.isoenen_US
dc.publisherROYAL SOC CHEMISTRYen_US
dc.subjectGAS-DIFFUSION BARRIERSen_US
dc.subjectALUMINUM-OXIDEen_US
dc.subjectMULTILAYER PASSIVATIONen_US
dc.subjectWATER-VAPORen_US
dc.subjectDEVICESen_US
dc.subjectPERFORMANCEen_US
dc.subjectTRANSISTORSen_US
dc.subjectTECHNOLOGYen_US
dc.subjectCRYSTALLIZATIONen_US
dc.subjectINTERLAYERen_US
dc.titleOptimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer depositionen_US
dc.typeArticleen_US
dc.relation.no2-
dc.relation.volume18-
dc.identifier.doi10.1039/c5cp06713h-
dc.relation.page1042-1049-
dc.relation.journalPHYSICAL CHEMISTRY CHEMICAL PHYSICS-
dc.contributor.googleauthorKim, Lae Ho-
dc.contributor.googleauthorJeong, Yong Jin-
dc.contributor.googleauthorAn, Tae Kyu-
dc.contributor.googleauthorPark, Seonuk-
dc.contributor.googleauthorJang, Jin Hyuk-
dc.contributor.googleauthorNam, Sooji-
dc.contributor.googleauthorJang, Jaeyoung-
dc.contributor.googleauthorKim, Se Hyun-
dc.contributor.googleauthorPark, Chan Eon-
dc.relation.code2016000207-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ENERGY ENGINEERING-
dc.identifier.pidjyjang15-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ENERGY ENGINEERING(에너지공학과) > Articles
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