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dc.contributor.author박진구-
dc.date.accessioned2017-08-03T02:07:31Z-
dc.date.available2017-08-03T02:07:31Z-
dc.date.issued2015-10-
dc.identifier.citationECS Transactions, v. 69, NO 8, Page. 69-75en_US
dc.identifier.isbn978-160768539-5-
dc.identifier.issn1938-5862-
dc.identifier.issn1938-6737-
dc.identifier.urihttp://ecst.ecsdl.org/content/69/8/69-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/28238-
dc.description.abstractIn this study, we investigated the relationship between particle removal efficiency (PRE), surface etch rate and removal of metal contaminant with various concentrations of SC1 cleaning solution. To identify the relationship between etch rate and the formation of defect, etch depth was measured for various compositions of SC-1 solution by using atomic force microscopy. Si wafers were contaminated with Cu ions and particles by dipping method. Cu precipitate and particles on Si surface were counted by using atomic force microscopy and a dark field optical microscope respectively to evaluate cleaning efficiency of SC1 solutions. The effect of SC1 compositions on Si etching was also investigated. It is observed that with increase in H2O2 concentration both Cu contamination and PRE decreases. This study suggests that the SCl cleaning solution needs to be optimized in order to achieve lower Cu contamination with a high PRE.en_US
dc.description.sponsorshipThis work was supported by the research fund of LG Siltron Inc.,en_US
dc.language.isoenen_US
dc.publisherElectro chemical socientyen_US
dc.titlePrevention of Metal Contamination in Sub 50 nm SC1 Cleaning Processen_US
dc.typeArticleen_US
dc.relation.no8-
dc.relation.volume69-
dc.identifier.doi10.1149/06908.0069ecst-
dc.relation.page69-75-
dc.contributor.googleauthorKim, Hyun-Tae-
dc.contributor.googleauthorPark, Gun-Ho-
dc.contributor.googleauthorCho, Byoung-Jun-
dc.contributor.googleauthorLee, Jung-Hwan-
dc.contributor.googleauthorKim, Min-Su-
dc.contributor.googleauthorKim, Jin-Yong-
dc.contributor.googleauthorPark, Jin-Goo-
dc.sector.campusS-
dc.sector.daehakGRADUATE SCHOOL[S]-
dc.sector.departmentDEPARTMENT OF BIONANOTECHNOLOGY-
dc.identifier.pidjgpark-
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GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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