Local Behavior of Deposition Velocity onto a Flat Plate in Horizontal Airflow under the Influence of Thermophoresis
- Title
- Local Behavior of Deposition Velocity onto a Flat Plate in Horizontal Airflow under the Influence of Thermophoresis
- Author
- 육세진
- Keywords
- PARTICLE DEPOSITION; SEMICONDUCTOR WAFERS; PARALLEL-FLOW; EUVL MASKS; CLEAN ROOM; SURFACE; ELECTROPHORESIS; DIFFUSION; FIELD
- Issue Date
- 2015-10
- Publisher
- TAYLOR & FRANCIS INC
- Citation
- AEROSOL SCIENCE AND TECHNOLOGY, v. 49, NO 10, Page. 920-927
- Abstract
- In this study, the Gaussian Diffusion Sphere Model (GDSM) and the Statistical Lagrangian Particle Tracking (SLPT) approach were employed and adjusted to calculate the local deposition velocity onto a flat plate in horizontal airflow. The GDSM and the SLPT approach were validated by comparing the predicted local deposition velocities with those determined by solving the equation of convective diffusion. Both the GDSM and the SLPT approach were found to be accurate in calculating the local deposition velocity onto a flat plate in horizontal airflow. In addition, the GDSM was much more efficient than the SLPT approach in terms of the calculation time. Finally, a parametric study on the local deposition velocity onto a flat plate exposed to horizontal airflow was performed using the GDSM with the consideration of the effects of the gravity, convection, diffusion, and thermophoresis.
- URI
- http://www.tandfonline.com/doi/abs/10.1080/02786826.2015.1085952http://hdl.handle.net/20.500.11754/27924
- ISSN
- 0278-6826; 1521-7388
- DOI
- 10.1080/02786826.2015.1085952
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > MECHANICAL ENGINEERING(기계공학부) > Articles
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