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Local Behavior of Deposition Velocity onto a Flat Plate in Horizontal Airflow under the Influence of Thermophoresis

Title
Local Behavior of Deposition Velocity onto a Flat Plate in Horizontal Airflow under the Influence of Thermophoresis
Author
육세진
Keywords
PARTICLE DEPOSITION; SEMICONDUCTOR WAFERS; PARALLEL-FLOW; EUVL MASKS; CLEAN ROOM; SURFACE; ELECTROPHORESIS; DIFFUSION; FIELD
Issue Date
2015-10
Publisher
TAYLOR & FRANCIS INC
Citation
AEROSOL SCIENCE AND TECHNOLOGY, v. 49, NO 10, Page. 920-927
Abstract
In this study, the Gaussian Diffusion Sphere Model (GDSM) and the Statistical Lagrangian Particle Tracking (SLPT) approach were employed and adjusted to calculate the local deposition velocity onto a flat plate in horizontal airflow. The GDSM and the SLPT approach were validated by comparing the predicted local deposition velocities with those determined by solving the equation of convective diffusion. Both the GDSM and the SLPT approach were found to be accurate in calculating the local deposition velocity onto a flat plate in horizontal airflow. In addition, the GDSM was much more efficient than the SLPT approach in terms of the calculation time. Finally, a parametric study on the local deposition velocity onto a flat plate exposed to horizontal airflow was performed using the GDSM with the consideration of the effects of the gravity, convection, diffusion, and thermophoresis.
URI
http://www.tandfonline.com/doi/abs/10.1080/02786826.2015.1085952http://hdl.handle.net/20.500.11754/27924
ISSN
0278-6826; 1521-7388
DOI
10.1080/02786826.2015.1085952
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MECHANICAL ENGINEERING(기계공학부) > Articles
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