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dc.contributor.author박진구-
dc.date.accessioned2017-04-27T05:34:35Z-
dc.date.available2017-04-27T05:34:35Z-
dc.date.issued2015-08-
dc.identifier.citationMICROELECTRONIC ENGINEERING, v. 143, NO Special SI, Page. 25-30en_US
dc.identifier.issn0167-9317-
dc.identifier.issn1873-5568-
dc.identifier.urihttp://www.sciencedirect.com/science/article/pii/S0167931715001148-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/27032-
dc.description.abstractThis article presents a facile single step fabrication method of complex 3D microstructures like microtips, microlenses, microtrapezoids, etc. with controlled dimensions which has been the main focus of researchers over the decades. Each type of above mentioned microstructures individually requires a large number of expensive and complex fabrication processes e.g. plasma RIE, stereo lithography, UV micro stamping and so on. In this study, we have proposed a simple, convenient, cost effective and commercially applicable one step dual diffuser lithography (DDL) method for the fabrication of such complex 3D microstructures by adding a pair of diffusers in conventional photolithography, which diffused the incident beam of ultraviolet (UV) light at wide angles. A conventionally used positive photoresist AZP 4620 was exposed to the diffused light at various exposure energies and the effect of change in exposure energy on the fabricated patterns was studied. Patterns with sub-micron dimensions and microtips with similar to 200 nm tip size were also fabricated using the proposed DDL process. The morphology of the fabricated patterns was analyzed using the field-emission scanning electron microscope (FE-SEM) images and 3-dimensional (3D) profiler data. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.description.sponsorshipThis research was supported by the Future Semiconductor Device Technology Development Program #10045366 funded By MOTIE (Ministry of Trade, Industry & Energy) and KSRC (Korea Semiconductor Research Consortium). H.H. acknowledges 90% Overseas Scholarship Program, Higher Education Commission (HEC), funded by Government of Pakistan.en_US
dc.language.isoenen_US
dc.publisherELSEVIER SCIENCE BVen_US
dc.subjectDual diffuser lithographyen_US
dc.subjectPhotolithographyen_US
dc.subjectMicrofabricationen_US
dc.subjectMicrotipsen_US
dc.subjectMicrolensen_US
dc.titleDimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)en_US
dc.typeArticleen_US
dc.relation.noSpecial SI-
dc.relation.volume143-
dc.identifier.doi10.1016/j.mee.2015.02.053-
dc.relation.page25-30-
dc.relation.journalMICROELECTRONIC ENGINEERING-
dc.contributor.googleauthorHafeez, Hassan-
dc.contributor.googleauthorRyu, Heon-Yul-
dc.contributor.googleauthorAn, Il Sin-
dc.contributor.googleauthorOh, Hye-Keun-
dc.contributor.googleauthorAhn, Jin-Ho-
dc.contributor.googleauthorPark, Jin-Goo-
dc.relation.code2015001922-
dc.sector.campusS-
dc.sector.daehakGRADUATE SCHOOL[S]-
dc.sector.departmentDEPARTMENT OF BIONANOTECHNOLOGY-
dc.identifier.pidjgpark-
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GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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