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dc.contributor.author정진욱-
dc.date.accessioned2017-04-19T00:50:25Z-
dc.date.available2017-04-19T00:50:25Z-
dc.date.issued2015-08-
dc.identifier.citationPHYSICS OF PLASMAS, v. 22, NO 8, Page. 1-7en_US
dc.identifier.issn1070-664X-
dc.identifier.issn1089-7674-
dc.identifier.urihttp://aip.scitation.org/doi/abs/10.1063/1.4928907-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/26789-
dc.description.abstractVibrational temperature (T-vib) of N-2 gas and electron energy distribution function (EEDF) were measured in Ar/N-2 mixture inductively coupled plasma (ICP). At a low gas pressure of 5 mTorr where the EEDF is bi-Maxwellian distribution, plasma density n(p) and T-vib (from 7000K to 5600 K) slightly decrease. However, remarkable decrease in n(p) and T-vib is found with the dilution of N-2 gas at a high gas pressure of 50 mTorr, where the EEDF is depleted Maxwellian distribution at a fixed ICP power of 150 W. When the ICP power increases from 150 W to 300 W at the gas pressure of 50 mTorr, the depleted tail on the EEDF is replenished, while n(p) is little changed with the dilution of N-2 gas. In this case, T-vib slightly decreases from 9500 K to 7600 K. These results indicate that the variation of T-vib is strongly correlated to the plasma parameters, such as the plasma density and EEDF. (C) 2015 AIP Publishing LLC.en_US
dc.description.sponsorshipThis work was supported by the Converging Research Center Program (NRF-2014M3C1A8053701) and the National R&D Program (NRF-2014M1A7A1A03045185) of the National Research Foundation of Korea funded by the Ministry of Education, Science, and Technology, and this work was supported by the Korea Electric Power Corporation Research Institute through Korea Electrical Engineering & Science Research Institute (R14XA02-3).en_US
dc.language.isoenen_US
dc.publisherAMER INST PHYSICSen_US
dc.subjectENERGY DISTRIBUTION FUNCTIONen_US
dc.subjectGAS TEMPERATUREen_US
dc.subjectRF DISCHARGEen_US
dc.subjectNITROGENen_US
dc.subjectARGONen_US
dc.subjectBANDSen_US
dc.subjectO-2en_US
dc.subjectCHen_US
dc.titleCorrelation between vibrational temperature of N-2 and plasma parameters in inductively coupled Ar/N-2 plasmasen_US
dc.typeArticleen_US
dc.relation.no8-
dc.relation.volume22-
dc.identifier.doi10.1063/1.4928907-
dc.relation.page1-7-
dc.relation.journalPHYSICS OF PLASMAS-
dc.contributor.googleauthorKim, Young-Cheol-
dc.contributor.googleauthorLee, Hyo-Chang-
dc.contributor.googleauthorKim, Yu-Sin-
dc.contributor.googleauthorChung, Chin-Wook-
dc.relation.code2015001483-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF ELECTRICAL AND BIOMEDICAL ENGINEERING-
dc.identifier.pidjoykang-
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COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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