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dc.contributor.author정진욱-
dc.date.accessioned2017-03-29T01:21:53Z-
dc.date.available2017-03-29T01:21:53Z-
dc.date.issued2015-07-
dc.identifier.citationPHYSICS OF PLASMAS, v. 22, NO 7, Page. 1-5en_US
dc.identifier.issn1070-664X-
dc.identifier.issn1089-7674-
dc.identifier.urihttp://aip.scitation.org/doi/abs/10.1063/1.4923276-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/26400-
dc.description.abstractThe gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics. (C) 2015 AIP Publishing LLC.en_US
dc.description.sponsorshipThis research was supported by the Converging Research Center Program (NRF-2014M3C1A8053701), the Industrial Strategic Technology Development Program (10041681), and the IT R&D program of MOTIE/KEIT (10045232).en_US
dc.language.isoenen_US
dc.publisherAMER INST PHYSICSen_US
dc.subjectELECTRON-ENERGY DISTRIBUTIONen_US
dc.subjectARGON DISCHARGEen_US
dc.subjectDENSITYen_US
dc.subjectUNIFORMITYen_US
dc.subjectDESIGNen_US
dc.subjectMODELen_US
dc.subjectARen_US
dc.titleExperimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasmaen_US
dc.typeArticleen_US
dc.relation.no7-
dc.relation.volume22-
dc.identifier.doi10.1063/1.4923276-
dc.relation.page1-5-
dc.relation.journalPHYSICS OF PLASMAS-
dc.contributor.googleauthorKim, Ju-Ho-
dc.contributor.googleauthorKim, Young-Cheol-
dc.contributor.googleauthorChung, Chin-Wook-
dc.relation.code2015001483-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF ELECTRICAL AND BIOMEDICAL ENGINEERING-
dc.identifier.pidjoykang-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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