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Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma

Title
Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma
Author
정진욱
Keywords
ELECTRON-ENERGY DISTRIBUTION; ARGON DISCHARGE; DENSITY; UNIFORMITY; DESIGN; MODEL; AR
Issue Date
2015-07
Publisher
AMER INST PHYSICS
Citation
PHYSICS OF PLASMAS, v. 22, NO 7, Page. 1-5
Abstract
The gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics. (C) 2015 AIP Publishing LLC.
URI
http://aip.scitation.org/doi/abs/10.1063/1.4923276http://hdl.handle.net/20.500.11754/26400
ISSN
1070-664X; 1089-7674
DOI
10.1063/1.4923276
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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