Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting
- Title
- Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting
- Author
- 정진욱
- Keywords
- Nanoparticles; Copper; Plasma; Plasma-Induced Dewetting
- Issue Date
- 2015-03
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 15, NO 3, Page. 2542-2546
- Abstract
- The effects of plasma parameters such as plasma density, electron temperature, and sheath voltage on the uniformity of Cu nanoparticle arrays were investigated. These parameters were controlled by varying the pressure, RF power, and substrate bias voltage. A floating harmonic method was used to monitor the plasma parameters. Uniform nanoparticle arrays were produced when hole generation was increased by using a high ion bombardment energy. As oppose to a low energy flux condition, where small and large nanoparticles coexisted due to a small number of holes, a larger number of holes was generated and distributed more uniformly during a high energy flux condition.
- URI
- http://www.ingentaconnect.com/content/asp/jnn/2015/00000015/00000003/art00099http://hdl.handle.net/20.500.11754/23319
- ISSN
- 1533-4880; 1533-4899
- DOI
- 10.1166/jnn.2015.10237
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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