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dc.contributor.author박진구-
dc.date.accessioned2016-08-26T02:04:54Z-
dc.date.available2016-08-26T02:04:54Z-
dc.date.issued2015-03-
dc.identifier.citationSPIE Proceedings, v. 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221O (March 19, 2015) Page. 1-11en_US
dc.identifier.issn0277-786X-
dc.identifier.urihttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210848-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/22784-
dc.description.abstractThe out-of-band (OoB) radiation that can cause serious aerial image deformation on the wafer is reported. In order to check the maximum allowable OoB radiation reflectivity at the extreme ultra-violet (EUV) pellicle, we simulated the effect of OoB radiation and found that the maximum allowable OoB radiation reflectivity at the pellicle should be smaller than 15 % which satisfy our criteria such as aerial image critical dimension (CD), contrast, and normalized image log slope (NILS). We suggested a new multi-stack EUV pellicle that can have high EUV transmission, minimal OoB radiation reflectivity, and enough deep ultra-violet transmission for inspection and alignment of the mask through the EUV pellicle. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.en_US
dc.language.isoenen_US
dc.publisherSPIEen_US
dc.subjectExtreme-Ultraviolet Lithographyen_US
dc.subjectEUV Pellicleen_US
dc.subjectMulti-Stack Pellicleen_US
dc.subjectContaminationen_US
dc.subjectOut-of-Band Radiationen_US
dc.titleMulti-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reductionen_US
dc.typeArticleen_US
dc.relation.volume9422-
dc.identifier.doi10.1117/12.2086052-
dc.relation.page1-11-
dc.contributor.googleauthorLee, Sung-Gyu-
dc.contributor.googleauthorKim, Guk-Jin-
dc.contributor.googleauthorKim, In-Seon-
dc.contributor.googleauthorAhn, Jin-Ho-
dc.contributor.googleauthorPark, Jin-Goo-
dc.contributor.googleauthorOh, Hye-Keun-
dc.sector.campusS-
dc.sector.daehakGRADUATE SCHOOL[S]-
dc.sector.departmentDEPARTMENT OF BIONANOTECHNOLOGY-
dc.identifier.pidjgpark-
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GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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