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dc.contributor.author이해원-
dc.date.accessioned2016-08-03T06:00:15Z-
dc.date.available2016-08-03T06:00:15Z-
dc.date.issued2015-02-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 15, NO 2, Page. 1764-1766en_US
dc.identifier.issn1533-4880-
dc.identifier.issn1533-4899-
dc.identifier.urihttp://www.ingentaconnect.com/content/asp/jnn/2015/00000015/00000002/art00132-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/22366-
dc.description.abstractPhotoacid generators (PAGs) have been widely used as a key component for improving photoresist performance. The acid diffusion influences on the photoresist characteristics of resolution and line edge roughness (LER). The PAG bound polymer resist has been a key component for solving the problems of PAG aggregation and acid diffusion control. A triphenyl sulfonium salt methacrylate as PAG was synthesized and copolymerized with crosslinkable glycidyl methacrylate and methyl methacrylate by radical reaction for a new PAG bound polymer resist. The characterization of resist polymers was carried out by H-1 NMR. The lithographic performance of photoresists was investigated by ArF lithography. Both PAG bound resist and the PAG blended resist were employed to demonstrate the effect of PAG unit in a resist system. The polymer bound PAG resist improved the LEA and showed a higher resolution than the PAG blend resist.en_US
dc.description.sponsorshipTechnology Innovation Program - Ministry of Knowledge and Economy (MKE, Korea) Priority Research Centers Program through National Research Foundation (NRF) of Koreaen_US
dc.language.isoenen_US
dc.publisherAMER SCIENTIFIC PUBLISHERSen_US
dc.subjectPolymer Bound PAG Resisten_US
dc.subjectPhotoacid Generatoren_US
dc.subjectArF Lithographyen_US
dc.subjectNegative Type Photoresisten_US
dc.titleEnhanced Acid Diffusion Control by Using Photoacid Generator Bound Polymer Resisten_US
dc.typeArticleen_US
dc.relation.no2-
dc.relation.volume15-
dc.identifier.doi10.1166/jnn.2015.9330-
dc.relation.page1764-1766-
dc.relation.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.contributor.googleauthorJung, Jin Hyuck-
dc.contributor.googleauthorKim, Min Jeong-
dc.contributor.googleauthorSohn, Kyung Hwa-
dc.contributor.googleauthorKang, Ha Na-
dc.contributor.googleauthorKang, Man Kyu-
dc.contributor.googleauthorLee, Haiwon-
dc.relation.code2015003357-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF NATURAL SCIENCES[S]-
dc.sector.departmentDEPARTMENT OF CHEMISTRY-
dc.identifier.pidhaiwon-
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COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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