Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진구 | - |
dc.date.accessioned | 2016-05-27T08:36:03Z | - |
dc.date.available | 2016-05-27T08:36:03Z | - |
dc.date.issued | 2015-01 | - |
dc.identifier.citation | Solid State Phenomena, v. 219, Page. 256-259 | en_US |
dc.identifier.issn | 1662-9779 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/21421 | - |
dc.identifier.uri | https://www.scientific.net/SSP.219.256 | - |
dc.description.abstract | Defects could be generated on the wafers by the particle contamination, formation of organic residue, corrosion, native oxide growth on the surface and airborne molecular contaminants (AMC) [1] etc. These problems hinder the device performance and also can decrease the yield and productivity in the semiconductor manufacturing process. It could be resolved by various cleaning methods [2]. However, the results such as corrosion, native oxide growth on wafer and AMC deposition should be handled properly by N2 gas purge prevention method during the process or standby [3,4]. It should be implemented before starting the process, which can maximize the productivity with a higher yield by minimizing the process queue and maintaining wafer surface integrity in sub 20 nm device fabrication. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Scitec Publications Ltd. | en_US |
dc.subject | Corrosion | en_US |
dc.subject | FOUP | en_US |
dc.subject | N2 Purge | en_US |
dc.subject | Process queue | en_US |
dc.title | Effect of FOUP atmosphere control on process wafer integrity in sub20nm device fabrication | en_US |
dc.type | Article | en_US |
dc.relation.volume | 219 | - |
dc.identifier.doi | 10.4028/www.scientific.net/SSP.219.256 | - |
dc.relation.page | 256-259 | - |
dc.relation.journal | Diffusion and Defect Data Pt.B: Solid State Phenomena | - |
dc.contributor.googleauthor | Kim, Bong Ho | - |
dc.contributor.googleauthor | Park, Jin Goo | - |
dc.relation.code | 2014007325 | - |
dc.sector.campus | S | - |
dc.sector.daehak | GRADUATE SCHOOL[S] | - |
dc.sector.department | DEPARTMENT OF BIONANOTECHNOLOGY | - |
dc.identifier.pid | jgpark | - |
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