Epitaxial growth of NbN thin films for electrodes using atomic layer deposition
- Title
- Epitaxial growth of NbN thin films for electrodes using atomic layer deposition
- Author
- 박태주
- Keywords
- Metal thin film; NbN; Epitaxy; Atomic layer deposition; Lattice matching
- Issue Date
- 2023-11-01
- Publisher
- ELSEVIER
- Citation
- APPLIED SURFACE SCIENCE, v. 636, article no 157824, page. 1-9
- Abstract
- The epitaxial growth of NbN thin film was accomplished via atomic layer deposition (ALD) for the first time using NbCl5 and NH3 as the Nb precursor and nitrogen source at a deposition temperature of 450 celcius. The cubic NbN thin film was grown epitaxially on a cubic MgO crystal through the coherent lattice matching between NbN and MgO with a small lattice mismatch (similar to 2.8%). A high concentration of Cl impurity of 4-5% remained in NbN thin films grown on a SiO2 substrate using ALD. However, the Cl impurity concentration decreased to similar to 2% in the epitaxially grown NbN thin films, which facilitated the epitaxial growth of NbN thin films on the MgO substrate. The origin was attributed to a residual strain at the NbN/MgO interface, which induced a bond length change in Nb-N-Cl. The bond length change may promote Cl desorption during NbN ALD because an in-plane compressive strain in the NbN film and an in-plane tensile strain in the MgO surface were observed. Finally, the epitaxially grown NbN thin film exhibited a 50% lower resistivity than that grown with a polycrystalline phase based on the enhanced carrier mobility owing to the improved crystallinity of epitaxial NbN thin films.
- URI
- https://www.sciencedirect.com/science/article/pii/S0169433223015039https://repository.hanyang.ac.kr/handle/20.500.11754/190810
- ISSN
- 0169-4332
- DOI
- https://doi.org/10.1016/j.apsusc.2023.157824
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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