Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 백운규 | - |
dc.contributor.author | 이강천 | - |
dc.date.accessioned | 2024-03-01T07:31:38Z | - |
dc.date.available | 2024-03-01T07:31:38Z | - |
dc.date.issued | 2020.8 | - |
dc.identifier.uri | http://hanyang.dcollection.net/common/orgView/200000438100 | en_US |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/188196 | - |
dc.description.abstract | Asthedesignrulesofsemiconductorshrinkstosub-7nmandsmaller,changesinmaterialsanddevicestructureshaverealizedthehighperformancedeviceswithnewtechnologies.Amongvariousmetalmaterials,especiallyrutheniumispromisingmaterialaselectrodematerialsforthecapacitorandbarriermaterialsforcopperinterconnectionduetoitsadvantagesoflowelectricalresistanceandexcellentthermal/chemicalstability. However,theseadvantageshavealimitationthatcausesgalvaniccorrosioninbimetallicsystemwithothermetals.Inthisregards,thegalvaniccorrosionshouldbeovercomeintermsofRCdelayanddegradationofthedevices.Therefore,inthisdissertation,whileprovidingthebasicinformationonrutheniumChemicalMechanicalPlanarization(CMP)slurries,thestrategiesandmechanismsforcontrollinggalvaniccorrosionbetweenrutheniumandcopperarecoveredforcopperinterconnectionbarrierstructure. Atfirst,apyridinearomaticcompoundisadoptedtosuppressgalvaniccorrosionincopper/rutheniumbimetallicsystem.Thenitrogenatomofthepyridinefunctionalgroupformsaσ-bondcomplexationwiththemetalcationandadsorbsontothebothcopperandrutheniumsurfaces.However,comparedtoruthenium,copperhasafullyoccupiedd-orbital,soitenablestoadditionalπ-bondingwithapyridineringstructure.Thedifferenceinbondingshowedadissimilarinadsorptionaffinitywitheachmetalion.Inresults,theanodicreactionofcoppersurfaceissuppressedeffectivelybyformingadensecorrosionprotectionlayerontothecopperfilm. Forfurtherstudy,threestructuralisomersofpyridinecarboxylicacidhavebeeninvestigated.Structurally,eachofthreeinhibitorsaresubstitutedtocarboxylgroupsatortho,meta,andparapositionsrespectivelyandareconsideredintermsofreactivitywithcopperions.Inthecaseofnicotinicacidinwhichthecarboxylgroupissubstitutedatthemetaposition,theelectronegativityofthenitrogenatomremainsunaffectedleadingtoformationwithmetalcationsviaσ-bond.Ontheotherhand,theinhibitorssubstitutedattheortho-andthepara-positionshowedrelativelyweakadsorptionaffinityduetoweakeningtheelectronegativityofnitrogenatoms.Furthermore,picolinicacidsubstitutedatadjacentpositiontoanitrogenatomshowedthelowestinhibitionefficiencyowingtosterichindranceeffect. Finally,byapplyingtheinhibitortothecopper/rutheniumbarrierCMPprocess,aslurrypreventsthegalvaniccorrosionattheinterfaceandachievesadesirableselectivityratioof1:1. | - |
dc.publisher | 한양대학교 | - |
dc.title | Designofcopper/rutheniumCMPslurryforgalvaniccorrosioninhibitionatitsinterface | - |
dc.title.alternative | 구리/루테늄계면에서갈바닉부식억제를위한CMP공정슬러리설계 | - |
dc.type | Theses | - |
dc.contributor.googleauthor | KangchunLEE | - |
dc.contributor.alternativeauthor | 이강천 | - |
dc.sector.campus | S | - |
dc.sector.daehak | 대학원 | - |
dc.sector.department | 에너지공학과 | - |
dc.description.degree | Doctor | - |
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