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dc.contributor.author정영대-
dc.date.accessioned2024-02-01T04:36:39Z-
dc.date.available2024-02-01T04:36:39Z-
dc.date.issued2023-12-26-
dc.identifier.citationPHYSICA SCRIPTAen_US
dc.identifier.issn1402-4896en_US
dc.identifier.urihttps://iopscience.iop.org/article/10.1088/1402-4896/ad15d1en_US
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/188137-
dc.description.abstractThe essence of Tsallis q-entropy on the occurrence scattering time (OST) process is derived for a nonextensive plasma. The semiclassical eikonal dissection and the nonextensive q-distribution function are used to derive the OST with variables of projectile energy, scattering angle, electron entropic index, ion entropic index, and impact parameter. Our calculations find that the OST advance in a nonextensive plasma decreases with the entropic index. We have seen that the Tsallis q-entropy on the OST advance grows up fast as the scattering angle increases. We also obtained that the nature of Tsallis q-entropy on the OST advance diminishes in forward scattering direction in a nonextensive plasma. Moreover, the authority of the electron q-entropy is found to be greater than the that of ion q-entropy in the cold electron plasma, i.e., when the electron temperature is lower than the ion temperature. However, if the ion temperature is lower than the electron temperature, the authority of the ion q-entropy is more momentous than that of the electron q-entropy.en_US
dc.description.sponsorshipThis paper is dedicated to the late Prof M Tribeche in memory of stimulating discussions on processes in nonextensive plasmas. The work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean Government (NRF-2019R1A2C1003363).en_US
dc.languageen_USen_US
dc.publisherIOP PUBLISHING LTDen_US
dc.relation.ispartofseriesv. 99, NO 1;156061-156068-
dc.subjectnonextensive plasmasen_US
dc.subjectoccurrence scattering timeen_US
dc.subjectq-entropyen_US
dc.titleInfluence of Tsallis q-entropy on occurrence scattering time in a nonextensive plasmaen_US
dc.typeArticleen_US
dc.relation.no1-
dc.relation.volume99-
dc.identifier.doi10.1088/1402-4896/ad15d1en_US
dc.relation.page156061-156068-
dc.relation.journalPHYSICA SCRIPTA-
dc.contributor.googleauthorLee, Myoung-Jae-
dc.contributor.googleauthorAshikawa, Naoko-
dc.contributor.googleauthorJung, Young-Dae-
dc.relation.code2024007133-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]-
dc.sector.departmentDEPARTMENT OF APPLIED PHYSICS-
dc.identifier.pidydjung-
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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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