Electrochemical Nucleation of SiOx Nanoparticles into the Pore Bottoms of an Anodic Aluminum Oxide
- Title
- Electrochemical Nucleation of SiOx Nanoparticles into the Pore Bottoms of an Anodic Aluminum Oxide
- Author
- 조용우
- Keywords
- SiOx Nanoparticle; Electrochemical Anodization; Porous Materisls
- Issue Date
- 2009-04
- Publisher
- American Scientific Publishers
- Citation
- Journal of Nanoscience and Nanotechnology, v. 9, NO. 4, Page. 2603-2606
- Abstract
- Utilizing the wafer-scale anodization of a thermally evaporated Ti layer onto a Si substrate, SiOx nanoparticles could be electrochemically nucleated into the pore bottoms of an anodic aluminum oxide. The formation of a Si-containing Ti layer (Ti1-xSix, x < 0.1) was identified between the Al and the silicon substrate by thermal diffusion of Si during the evaporation. Upon prolonged anodization of similar to 1 h after alumina barrier layer touched the Si-containing Ti layer, pyramid-shaped TiOx nanopillars formed underneath the pore bottoms as a result of a curvature inversion of the barrier oxide with Ti migration. These TiOx nanopillars were observed to act as a diffusion route of silicon from the Si-containing Ti layer. Only one SiOx nanoparticle (similar to 8 +/- 5 nm) for each pore was generally precipitated without Ti contamination. This finding suggests a new route which can make SiOx nanoparticles confined within an anodic aluminum oxide template.
- URI
- https://www.ingentaconnect.com/content/asp/jnn/2009/00000009/00000004/art00054;jsessionid=3p0ktmjongk1r.x-ic-live-02https://repository.hanyang.ac.kr/handle/20.500.11754/183778
- ISSN
- 1533-4880;1533-4899
- DOI
- 10.1166/jnn.2009.dk18
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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