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Lithography Technology for Micro- and Nanofabrication

Title
Lithography Technology for Micro- and Nanofabrication
Author
이승환
Keywords
Lithography; Nanofabrication; Photolithography; Electron beam lithography; Focused ion beam lithography; Nanoimprint lithography; Jet and flash imprint lithography; Deformation lithography; Material-based lithography; Colloidal lithography
Issue Date
2021-03
Publisher
SPRINGER INTERNATIONAL PUBLISHING AG
Citation
ADVANCES IN EXPERIMENTAL MEDICINE AND BIOLOGY, v. 1309, Page. 217-233
Abstract
Micro and nanofabrication technologies are integral to the development of miniaturized systems. Lithography plays a key role in micro and nanofabrication techniques. Since high functional miniaturized systems are required in various fields, such as the development of a semiconductor, chemical and biological analysis, and biomedical researches, lithography techniques have been developed and applied for their appropriate purpose. Lithography can be classified into conventional and unconventional lithography, or top-down and bottom-up, or with mask and mask-less approaches. In this chapter, various lithography techniques are categorized and classified into conventional and unconventional lithography. In the first part, photolithography, electron beam, and focused-ion beam lithography are introduced as conventional lithography techniques. The second part introduces nanoimprint lithography, deformation lithography, and colloidal lithography as unconventional lithography techniques. In the last part, the pros and cons of each lithography are discussed for an appropriate design of fabrication processes.
URI
https://link.springer.com/chapter/10.1007%2F978-981-33-6158-4_9https://repository.hanyang.ac.kr/handle/20.500.11754/166876
ISSN
0065-2598
DOI
10.1007/978-981-33-6158-4_9
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > BIONANO ENGINEERING(생명나노공학과) > Articles
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