Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김곤호 | - |
dc.date.accessioned | 2021-04-26T04:51:48Z | - |
dc.date.available | 2021-04-26T04:51:48Z | - |
dc.date.issued | 2000-06 | - |
dc.identifier.citation | PLASMA SOURCES SCIENCE & TECHNOLOGY, v. 9, no. 1, page. 5-11 | en_US |
dc.identifier.uri | https://iopscience.iop.org/article/10.1088/0963-0252/9/1/302/meta | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/161681 | - |
dc.description.abstract | Time-averaged plasma potential in an inductive source with a ground wall has been measured by using an emissive probe. The inflection point method in the limit of zero emission is employed to determine the plasma potential. In this source, capacitive couplingresults in a fluctuating plasma potential. The peak-to-peak value of the radiofrequency (RF) fluctuations, which is approximately given by the separation of the two peaks in the derivative of an I–V characteristic curve, has been reduced by introducing a gap between the antenna and the quartz window and by various electrostatic screens. Experimental data show that the lower potential peak, representing the lowest plasma potential, was approximately constant as the RF fluctuation level was reduced, while the higher potential peak, indicating the more positive plasma potential, changed and approached the lower potential peak. For very low fluctuation level, the lower potential peak becomes the dc plasma potential and only the higher potential peak responds to the RF fluctuation. | en_US |
dc.description.sponsorship | This research was supported by the National Science Foundation of the USA, grants NSF EEC-8721545 and NSF ECS-9529565. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | IOP Publishing Ltd | en_US |
dc.title | Asymmetric plasma potential fluctuation in an indutive plasma source | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1088/0963-0252/9/1/302 | - |
dc.relation.journal | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.contributor.googleauthor | Lho, T | - |
dc.contributor.googleauthor | Hershkowitz, N | - |
dc.contributor.googleauthor | Kim, G H | - |
dc.contributor.googleauthor | Steer, W | - |
dc.contributor.googleauthor | Miller, J | - |
dc.relation.code | 2012207690 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF SCIENCE & TECHNOLOGY[E] | - |
dc.sector.department | DIVISION OF SCIENCE & TECHNOLOGY | - |
dc.identifier.pid | ghkim | - |
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