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dc.contributor.author이진복-
dc.contributor.author이명호-
dc.contributor.author이혜정-
dc.contributor.author박진석-
dc.date.accessioned2021-04-16T00:16:56Z-
dc.date.available2021-04-16T00:16:56Z-
dc.date.issued2001-11-
dc.identifier.citation대한전기학회 전기물성·응용부문회 2001 추계학술대회 논문집, page. 3-5en_US
dc.identifier.urihttps://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE01321815?-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/161503-
dc.description.abstract본 연구에서는 ZnO 박막의 배향특성 및 결정성을 향상시키기 위해서 2단계 증착법으로 증착하였다. ZnO th in films are deposited on S i 0 2 / S i ( l l l ) substrate by RF magnetron sputtering. The two-step deposition method is proposed to enhance both the c-axis orientation and the resistivity of ZnO films. This method consists of the following two procedures: the lst-deposition for 30 min w ithout oxygen at 100W and the 2nd~deposition with oxygen added in the range of 02/(Ar+C)2) = 1ᄋ〜50%. Effects of therma l treatm en t on the properties of ZnO films are systematically investigated.en_US
dc.description.sponsorship본 연구는 한국학술진흥재단의 연구비(KRF-99~04l-E00165} 지원과 한양대학교 전자재료 및 부품 연구센터(EM&C)의 시설/기자재 지원 등에 의하여 수행되었음.en_US
dc.language.isoko_KRen_US
dc.publisher대한전기학회en_US
dc.title2단계 증착법을 이용하여 증착한 ZnO 박막의 열처리 효과 분석en_US
dc.title.alternativeCharacterization of Heat Treatment Effects on ZnO Films Deposited by Two-step Methoden_US
dc.typeArticleen_US
dc.relation.journal전기학회논문지(A,B,C,D)-
dc.contributor.googleauthor이진복-
dc.contributor.googleauthor이명호-
dc.contributor.googleauthor이혜정-
dc.contributor.googleauthor박진석-
dc.relation.code2012101073-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDIVISION OF ELECTRICAL ENGINEERING-
dc.identifier.pidjinsp-
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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