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Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant

Title
Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant
Author
박진성
Keywords
RAMAN-SPECTROSCOPY; GRAPHENE; GROWTH; CARBON; AL2O3; ENCAPSULATION; POLYMER; FTIR; NANOCOMPOSITE; FABRICATION
Issue Date
2020-03
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v. 38, no. 2, article no. 022411
Abstract
Molecular layer deposition (MLD) is a thin film technique to make a pure organic coating or hybrid organic–inorganic film, sequentially dosing organic–organic or organic–inorganic precursors, respectively. In this study, hybrid organic–inorganic alucone films were fabricated via MLD using 4-mercaptophenol and trimethylaluminum as organic and metal precursors, respectively, over the deposition temperature range of 100–200 °C. The fabricated film was very stable without degradation when exposed to the atmosphere, and the characteristic change was confirmed through annealing under vacuum at 300–750 °C. After annealing, the thickness of the alucone films decreased and the bonding of the carbon ring changed, as revealed by the spectroscopic ellipsometer, Fourier-transform infrared, Raman, x-ray diffraction, and x-ray photoelectron spectroscopy results. The annealed alucone films showed thermal polymerization, and their carbon ring structures transformed into graphitic carbon flakes. The alucone film annealed at 750 °C showed an electrical resistivity of 0.55 Ω cm. Annealed MLD alucone films, which are hybrid materials, are potential candidates for applications in electronic, capacitor, and thermoelectric devices.
URI
https://avs.scitation.org/doi/10.1116/1.5134055https://repository.hanyang.ac.kr/handle/20.500.11754/158882
ISSN
0734-2101; 1520-8559
DOI
10.1116/1.5134055
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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