92 0

Full metadata record

DC FieldValueLanguage
dc.contributor.author오혜근-
dc.date.accessioned2020-10-26T02:30:57Z-
dc.date.available2020-10-26T02:30:57Z-
dc.date.issued2004-11-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.22, Issue.6, Page.2984-2986en_US
dc.identifier.issn10711023-
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-13244251459&origin=inward&txGid=e222e1139b7ad2e5a359216a85d56f2a-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/154816-
dc.description.abstractThe pattern printability of the Ru/Mo/Si system was quantitatively investigated by two successive schemes, reflectivity of the mask, and aerial image intensity transferred through the system. The reflectivity of a Ru/Mo/Si reflector was calculated and compared with the value of Mo/Si reflector for various incident angles (0degrees-5degrees) using Fresnel equation. In order to verify angular dependency of aerial image intensity in a Ru/Mo/Si reflector, we employed SOLID-EUV, which is capable of rigorous electromagnetic field computation. In the calculation, 100 nm line and space pattern was generated by 2D mask geometry with perfect absorber of opaque material. Through the investigation of the angular dependency on the pattern printability of Ru/Mo/Si and Mo/Si reflectors, we could suggest the optimal reflector system for specific condition of incident angle, i.e., Ru/Mo/Si system for less than or similar to3degrees and Mo/Si system for 4degrees for maximizing optical performance of the EUVL system. (C) 2004 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.publisherAMER INST PHYSICSen_US
dc.titleAngular dependency of off-axis illumination on 100 nm width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector systemen_US
dc.typeArticleen_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.contributor.googleauthorKang, I.-Y.-
dc.contributor.googleauthorChung, Y.-C.-
dc.contributor.googleauthorAhn, J.-
dc.contributor.googleauthorOh, H.-K.-
dc.contributor.googleauthorWatanabe, T.-
dc.contributor.googleauthorKinoshita, H.-
dc.relation.code2009206100-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]-
dc.sector.departmentDEPARTMENT OF APPLIED PHYSICS-
dc.identifier.pidhyekeun-
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE