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PECVD법에 의한 TiN, TiCN 증착 시 gradient plasma power가 코팅층에 미치는 영향

Title
PECVD법에 의한 TiN, TiCN 증착 시 gradient plasma power가 코팅층에 미치는 영향
Other Titles
Effect of Gradient Plasma Power on TiN, TiCN Coating Deposited by PECVD Process
Author
남태운
Keywords
PECVD; Gradient Plasma Power; GPP; TiN; TiCN; Adhesion force; Micro vickers hardness
Issue Date
2004-08
Publisher
한국열처리공학회
Citation
열처리공학회지, v. 17, No. 4, Page. 236-240
Abstract
Effect of plasma power on PECVD process were investigated in this study. TiN and TiCN films were deposited on nitrided STD11 steel with 600W, 1,200W and 1,600W plasma power. As the plasma power was increased, the preferred orientation was reinforced from (200) to (111) and the hardness of films was improved. The low plasma power was, however, effective for improving of adhesion force of films. Regarding above proper-ties, TiN and TiCN films were deposited by gradient plasma power. It was possible to get high hardness as well as adhesion force through gradient plasma power.
URI
https://information.hanyang.ac.kr/#/eds/detail?an=edskci.ARTI.250002&dbId=edskcihttps://repository.hanyang.ac.kr/handle/20.500.11754/151690
ISSN
1225-1070
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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