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Photoinduced patterning of gold thin film

Title
Photoinduced patterning of gold thin film
Author
오혜근
Keywords
Etching; Inductively coupled plasma; Etching rate
Issue Date
2004-08
Publisher
INST PURE APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v. 43, No. 8 B, Page. L1078-L1080
Abstract
We report a novel etching technique for gold film based on a new phenomenon that gold is soluble in chlorine-containing solutions or solvents under UV irradiation. This is a promising method for gold patterning possibly in microdevice or nanodevice fabrication. Mask patterns can be transferred to a gold surface directly without resorting to a complex photoresist process, and etch rate can be controlled from sub-nanometer to a few tens of nanometers per minute by adjusting exposure parameters. Moreover, nontoxic liquid such as NaCl solution can be used for the process.
URI
https://iopscience.iop.org/article/10.1143/JJAP.43.L1078/pdfhttps://repository.hanyang.ac.kr/handle/20.500.11754/151556
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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