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dc.contributor.author설원제-
dc.date.accessioned2020-06-05T06:29:36Z-
dc.date.available2020-06-05T06:29:36Z-
dc.date.issued2019-10-
dc.identifier.citationNANOTECHNOLOGY, v. 30, no. 40, article no. 405203en_US
dc.identifier.issn0957-4484-
dc.identifier.issn1361-6528-
dc.identifier.urihttps://iopscience.iop.org/article/10.1088/1361-6528/ab2feb-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/151480-
dc.description.abstractWe investigated the performance improvement of tin disulfide channel transistors by graphene contact configurations. From its two-dimensional nature, graphene can make electric contacts only at the outermost layers of the channel. For intralayer current flow, two graphene flakes are contacted at the channel's top or bottom layer. For interlayer current flow, one flake is contacted at the top and bottom of each layer. We compared the transistor performance in terms of current magnitude, mobility, and subthreshold swing between the configurations. From such observations, we deduced that device characteristics depend on resistivity or doping level of individual graphene flakes. We also found that interlayer flow excels in the on-current magnitude and the mobility, and that top-contact configuration excels in the subthreshold swing.en_US
dc.description.sponsorshipThis work was supported by the Basic Science Research Program in the National Research Foundation (NRF) in the Ministry of Education of Korea (NRF-2016R1D1A1B03934731), by a grant funded by NRF of the Ministry of Education of Korea (NRF-2014M3A7B4049369), and by Priority Research Centers Program through NRF funded by the Ministry of Education of Korea (NRF-2012R1A6A1029029).en_US
dc.language.isoenen_US
dc.publisherIOP PUBLISHING LTDen_US
dc.subjecttransistoren_US
dc.subjectgrapheneen_US
dc.subjecttransition metal dichalcogenideen_US
dc.subjecttin disulfideen_US
dc.subjectnanoelectronicen_US
dc.titleGraphene surface contacts of tin disulfide transistors for switching performance improvement and contact resistance reductionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/1361-6528/ab2feb-
dc.relation.page405203-405203-
dc.relation.journalNANOTECHNOLOGY-
dc.contributor.googleauthorSul, Onejae-
dc.contributor.googleauthorBang, Jiyoung-
dc.contributor.googleauthorYeom, Seong-Oh-
dc.contributor.googleauthorRyu, Gunwoo-
dc.contributor.googleauthorJoo, Hyung-Bin-
dc.contributor.googleauthorKim, Sun-Jin-
dc.contributor.googleauthorYang, Heewon-
dc.contributor.googleauthorLee, Jusin-
dc.contributor.googleauthorLee, Gunwoo-
dc.contributor.googleauthorChoi, Eunsuk-
dc.relation.code2019001118-
dc.sector.campusS-
dc.sector.daehakRESEARCH INSTITUTE[S]-
dc.sector.departmentINSTITUTE OF NANO SCIENCE AND TECHNOLOGY-
dc.identifier.pidojsul-
dc.identifier.orcidhttps://orcid.org/0000-0003-4151-9848-
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RESEARCH INSTITUTE[S](부설연구소) > ETC
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